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SUSE Linux Enterprise Server 16 Becomes First Enterprise Linux With Built-In Agentic AI

1 week 2 days ago
BrianFagioli shares a report from NERDS.xyz: SUSE is making headlines with the release of SUSE Linux Enterprise Server 16, the first enterprise Linux distribution to integrate agentic AI directly into the operating system. It uses the Model Context Protocol (MCP) to securely connect AI models with data sources while maintaining provider freedom. This gives organizations the ability to run AI-driven automation without relying on a single ecosystem. With a 16-year lifecycle, reproducible builds, instant rollback capabilities, and post-2038 readiness, SLES 16 also doubles down on long-term reliability and transparency. For enterprises, this launch marks a clear step toward embedding intelligence at the infrastructure level. The system can now perform AI-assisted administration via Cockpit or the command line, potentially cutting downtime and operational costs. SUSE's timing might feel late given the AI boom, but its implementation appears deliberate -- balancing innovation with the stability enterprises demand. It's likely to pressure Red Hat and Canonical to follow suit, redefining what "AI-ready" means for Linux in corporate environments.

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US Startup Substrate Announces Chipmaking Tool That It Says Will Rival ASML

1 week 2 days ago
An anonymous reader quotes a report from Reuters: Substrate, a small U.S. startup, said on Tuesday that it had developed a chipmaking tool capable of competing with the most advanced lithography equipment made by Dutch firm ASML. Substrate's tool is the first step in the startup's ambitious plan to build a U.S.-based contract chip-manufacturing business that would compete with Taiwan's TSMC in making the most advanced AI chips, its CEO James Proud told Reuters in an interview. Proud wants to slash the cost of chipmaking by producing the tools needed much more cheaply than rivals. [...] An engineering feat that has eluded even large companies, lithography needs extreme precision. ASML is the only company in the world that has been able to make at scale the complex tools that use extreme ultraviolet (EUV) to produce patterns on silicon wafer at a high rate of throughput. Substrate said that it has developed a version of lithography that uses X-ray light and is capable of printing features at resolutions that are comparable to the most advanced chipmaking tools made by ASML that cost more than $400 million apiece. The company said it has conducted demonstrations at U.S. National Laboratories and at its facilities in San Francisco. The company provided high resolution images that demonstrate the Substrate tool's capabilities. "This is an opportunity for the U.S. to recapture this market with a homegrown company," Oak Ridge National Laboratory director Stephen Streiffer, an expert on high-energy x-ray beams, said in an interview. "It's a nationally important effort and they know what they're doing."

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